P400 Removal system of photoresist and other organic compounds by dry plasma process - ALLIANCE CONCEPT

P400 Removal system of photoresist and other organic compounds by dry plasma process

Automatic industrial machine. Fast treatment, easy to carry out. Small and easy maintenance. Compact equipment, easily integrated in industrial environment.Smooth and dry [...] + informations

P400 Removal system of photoresist and other organic compounds by dry plasma process

Automatic industrial machine. Fast treatment, easy to carry out. Small and easy maintenance. Compact equipment, easily integrated in industrial environment.
Smooth and dry treatment, without pollution nor substrates degradation. Upgradeable process for surface treatment...

 

A brand of InfoPro Communications