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ALLIANCE CONCEPT

Alliance Concept

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Offers 1 to 18 of 18

Decoration 

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Decora700 Industrial sputtering system for decorative and technical applications
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Decora700 Industrial sputtering system for decorative and technical applications

The DECORA equipment range is composed with two complementary sizes systems : DECORA 700 (700mm diameter chamber) and DECORA 1200 (1200mm diameter chamber).  
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MIH 1900 Industrial vacuum metallization
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MIH 1900 Industrial vacuum metallization

Simple and highly flexible the MIH1900 guarantees high yield in your production.Multiple processes for various industrial applications. Metallization chamber.Choice of various [...]

Production equipment electronics 

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AC 450 Thin films by cathode sputtering
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AC 450 Thin films by cathode sputtering

Simple and highly flexible the AC450 guarantees success in your research activities.Multiple processes for various High-Tech applications. A specific configuration for each [...]
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DP 605 Thin films sputtering system
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DP 605 Thin films sputtering system

Modular and scalable system for multi layers and materials applicability. Diversity of processes (DC, RF, bias RF / DC) for all materials. Equipment is designed for any kind of [...]
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DP 850 Multi cathodes system for vacuum coating
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DP 850 Multi cathodes system for vacuum coating

Designed for large volume and optimal quality. Special device for thin layer coating by co-sputtering. High quality coating. Optimum yield. User-friendly interface. Dedicated [...]
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EVA 450 Thin layer coating by evaporation
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EVA 450 Thin layer coating by evaporation

Simple and highly flexible the EVA450 guarantees success in your new developments.Multiple processes for various High-Tech applications.A specific configuration for each [...]
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EVA760 High throughput electron beam evaporator
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EVA760 High throughput electron beam evaporator

High productivity, low up time, fast loading / unloading, a partner for your success. Broad application and processes versatility. Large machine throughput.High quality layers and [...]

Evaporators 

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CT500 Cluster tool, multi chambers and multi-processes coating system
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CT500 Cluster tool, multi chambers and multi-processes coating system

Multi-chambers and multi-functions system for high quality layers without any contamination.  
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EVA300 Compact and modular evaporation – sputtering system
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EVA300 Compact and modular evaporation – sputtering system

An optimized conception which guarantees the quality of your research for a cost-effective investment.Coatings responding to your quality standards.A wide choice of substrate [...]
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LINE 440 In line horizontal thin films sputter machine
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LINE 440 In line horizontal thin films sputter machine

Larges processes diversity for thin films mass production. Flexibility in design; low footprint. Optimized loading / unloading load lock for fast processes cycle. User-friendly [...]
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Engraving 

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RIE 250 Reactive ion etching system
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RIE 250 Reactive ion etching system

R&D, production. Semiconductors materials, dielectric and metals dry etching through photo-resist mask. High performance process for standard quality in the micro-electronic [...]

Special machines 

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USION 2.5
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USION 2.5

This equipment destined to treat telescope mirrors of 2.5m diameter by ion polishing (ultimate polishing step). The work chamber volume presented below is 28 m3.  The ion gun [...]
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Usion 0.3
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Usion 0.3

This equipment destined to treat telescope mirrors of 0,3m diameter. For this configuration the ion gun is fixed and the mirror to polish is positioned on a 5 axis [...]
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MIH 2800 Large size equipments
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MIH 2800 Large size equipments

Metal coater for large size plastic parts. Work chamber diameter 2,80 m for 4 m length.  
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Facet 1600
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Facet 1600

This equipment is developed to realize metal coatings by magnetron sputtering on bulk pieces. Work chamber diameter 2,00 m for 4,50 m length. The work chamber is divided in two [...]
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DP 2000 Special equipments
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DP 2000 Special equipments

Coating equipments comprising six independent chambers with an insertion load lock. This machine is developed to the DVD-RW elaboration.  

Plasma discharge, Corona discharge 

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Plasma activation
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Plasma activation

Surface tension modification by crystalline structure reorganization.  
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P400 Removal system of photoresist and other organic compounds by dry plasma process

Automatic industrial machine. Fast treatment, easy to carry out. Small and easy maintenance. Compact equipment, easily integrated in industrial environment.Smooth and dry [...]

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Lumaphore 440

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